| 发明名称 |
Apparatus and Method for Wafer Edge Defects Detection |
| 摘要 |
A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system a image processor to automatically detect and characterize defects on the wafer's edge.
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| 申请公布号 |
US2009116727(A1) |
申请公布日期 |
2009.05.07 |
| 申请号 |
US20080188849 |
申请日期 |
2008.08.08 |
| 申请人 |
ACCRETECH USA, INC. |
发明人 |
JIN JU;SADAM SATISH;VERMA VISHAL;HUANG ZHIYAN;LIN SIMING;ROBBINS MICHAEL D.;FORDERHASE PAUL F. |
| 分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
| 代理机构 |
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