| 摘要 |
Disclosed is a half-tone mask wherein versatility of the etching stopper layer is improved. Specifically, a half-tone mask (10) is provided with a transmitting section (TA) wherein a glass substrate (S) is used; a first semi-transmitting section (HA) which includes a first semi-transmitting layer (11) formed on the glass substrate; and a light blocking section (PA), which includes the first semi-transmitting layer, a light blocking layer (13) stacked above the first semi-transmitting layer, and an etching stopper layer (12) formed between the first semi-transmitting layer and the light blocking layer. The first semi-transmitting layer and the light blocking layer are respectively composed of at least one type of material selected from among a group composed of Cr, Cr oxide, nitride, carbide, oxynitride, oxycarbide, carbonitride and oxycarbonitride. The etching stopper layer contains at least one first element selected from among a group composed of Fe, Ni and Co, and at least one second element selected from among a group composed of Al, Si, Ti, Nb, Ta, Hf and Zr. |
