PHOTOMASK AND METHOD FOR FORMING SEMICONDUCTOR DEVICE USING THE SAME,申请号KR20070140871-传众专利搜索

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发明名称	PHOTOMASK AND METHOD FOR FORMING SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号	KR100895401(B1)	申请公布日期	2009.05.06
申请号	KR20070140871	申请日期	2007.12.28
申请人	HYNIX SEMICONDUCTOR INC.	发明人	BAE, SANG MAN
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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