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发明名称
SEQEUNTIAL CHEMICAL VAPOR DEPOSITION
摘要
申请公布号
KR20090043593(A)
申请公布日期
2009.05.06
申请号
KR20097005959
申请日期
2000.04.14
申请人
发明人
分类号
B01J19/08;C23C16/455;C23C16/44;C23C16/452;C23C16/50;C23C16/507;C30B25/14;H01L21/20;H01L21/31
主分类号
B01J19/08
代理机构
代理人
主权项
地址
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