发明名称 METHOD OF PRODUCING A THIN LAYER OF A SEMICONDUCTOR MATERIAL ON A SUBSTRATE AND INTERMEDIATE SUBSTRATE
摘要 Methods are provided for producing a transfer layer of a semiconductor material on a final substrate. In some embodiments, the transfer layer is produced on the final substrate by forming a layer of semiconductor material on an initial support, assembling that layer and a final substrate by metal bonding, and mechanically separating the initial support from the layer at a weak interface that initially attached the layer to the initial support. An intermediate substrate can be obtained which can be used to fabricate a variety of components such as light-emitting diodes or laser diodes. These techniques can produce a transfer layer on a final substrate and a recyclable initial support that can be detached from the transfer layer for recycling by a non-destructive mechanical release.
申请公布号 KR100896095(B1) 申请公布日期 2009.05.06
申请号 KR20087007939 申请日期 2008.04.01
申请人 发明人
分类号 H01L33/00;H01L21/762 主分类号 H01L33/00
代理机构 代理人
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