发明名称 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R 1 is a hydrogen atom or a methyl group, and R 2 is - CO-, -COO- or -COOR 3 - (wherein R 3 is an alkylene group of 2 to 6 carbon atoms).
申请公布号 EP2055726(A1) 申请公布日期 2009.05.06
申请号 EP20070792479 申请日期 2007.08.14
申请人 SHOWA DENKO K.K. 发明人 IKEDA, HARUHIKO;MIYATA, HIDEO;HATTORI, YOTARO;MUROFUSHI, KATSUMI
分类号 C08F20/38;C07C333/04;C07C333/08;C07C333/10;C08F2/50;G02B5/20;G03F7/004;G03F7/027 主分类号 C08F20/38
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