发明名称 |
THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii).
wherein R 1 is a hydrogen atom or a methyl group, and R 2 is - CO-, -COO- or -COOR 3 - (wherein R 3 is an alkylene group of 2 to 6 carbon atoms). |
申请公布号 |
EP2055726(A1) |
申请公布日期 |
2009.05.06 |
申请号 |
EP20070792479 |
申请日期 |
2007.08.14 |
申请人 |
SHOWA DENKO K.K. |
发明人 |
IKEDA, HARUHIKO;MIYATA, HIDEO;HATTORI, YOTARO;MUROFUSHI, KATSUMI |
分类号 |
C08F20/38;C07C333/04;C07C333/08;C07C333/10;C08F2/50;G02B5/20;G03F7/004;G03F7/027 |
主分类号 |
C08F20/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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