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发明名称
后CMP清洗用之改良硷性化学
摘要
本揭示系讨论在制造半导体装置期间,半导体晶圆在晶圆化学机械平坦化(CMP)之后的清洁。所揭示的是用于含金属,特别是含铜互连线之晶圆后CMP清洁用之硷性化学。残留浆液颗粒,特别系铜或其他金属颗粒,系由晶圆表面移除而无显着蚀刻金属、留下沈积物于表面上或对晶圆造成重大污染,同时亦保护该金属以防止氧化及腐蚀。此外,存在至少一种强钳合剂以与溶液中之金属离子错合而有助于自介电质移除金属并防止再沈积在晶圆上。
申请公布号
TW200918663
申请公布日期
2009.05.01
申请号
TW097127737
申请日期
2008.07.22
申请人
液态空气乔治斯克劳帝方法研究开发股份有限公司
发明人
马太L 费雪;爱莎特许 米莎
分类号
C11D1/62(2006.01);C11D3/00(2006.01);C11D7/06(2006.01);H01L21/304(2006.01)
主分类号
C11D1/62(2006.01)
代理机构
代理人
桂齐恒;阎启泰
主权项
地址
法国
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