MASK DATA GENERATION METHOD, MASK FABRICATION METHOD, EXPOSURE METHOD, DEVICE FABRICATION METHOD AND PROGRAM FOR GENERATION OF MASK DATA

摘要

PROBLEM TO BE SOLVED: To provide a generation method of generating mask data for forming a fine pattern with high precision.

SOLUTION: The generation method generates mask data by a computer, the mask to be used in an exposure device including: an illumination optical system illuminating the mask with light from a light source; and a projection optical system projecting the pattern of the mask onto a substrate. The method for generating mask data comprises determining a main pattern on the basis of an approximated aerial image and inserting an assist pattern.

COPYRIGHT: (C)2009,JPO&INPIT