发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
摘要 A conductive film embedded in a predetermined region on an upper surface of an insulation film and metallic wirings embedded so as to penetrate through the conductive film and protrudes into the insulation film constitute a lower electrode of an MIM capacitor.
申请公布号 US2009108405(A1) 申请公布日期 2009.04.30
申请号 US20080257700 申请日期 2008.10.24
申请人 OOTANI ITARU;HAYASHI SHINICHIRO;NISHIURA SHINJI 发明人 OOTANI ITARU;HAYASHI SHINICHIRO;NISHIURA SHINJI
分类号 H01L29/92;H01L21/02 主分类号 H01L29/92
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