发明名称 TECHNIQUES FOR REMOVING MOLECULAR FRAGMENTS FROM AN ION IMPLANTER
摘要 Techniques for removing molecular fragments from an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for removing molecular fragments from an ion implanter. The apparatus may comprise a supply mechanism configured to couple to an ion source chamber and to supply a feed material to the ion source chamber. The apparatus may also comprise one or more hydrogen-absorbing materials placed in a flow path of the feed material, to prevent at least one portion of hydrogen-containing molecular fragments in the feed material from entering the ion source chamber.
申请公布号 WO2008136858(A3) 申请公布日期 2009.04.30
申请号 WO2007US84102 申请日期 2007.11.08
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;HATEM, CHRISTOPHER, R.;SCHEUER, JAY, THOMAS;LOW, RUSSELL, J.;EVANS, MORGAN, D.;ENGLAND, JONATHAN, GERALD 发明人 HATEM, CHRISTOPHER, R.;SCHEUER, JAY, THOMAS;LOW, RUSSELL, J.;EVANS, MORGAN, D.;ENGLAND, JONATHAN, GERALD
分类号 H01J7/18;C01B3/00;H01J27/02;H01J37/317 主分类号 H01J7/18
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