发明名称 DEFECT CLASSIFICATION METHOD AND DEFECT CLASSIFICATION APPARATUS
摘要 <p>In a defect classification of an appearance inspection, there are needs to make the purity or accuracy of a critical defect or both adjusted to be equal to or more than a target value. However, since a condition of an instruction type defect classification is set so as to allow high correct answer rate on average, the defect classification has such a problem that it cannot comply with the needs. A defect classification method includes a characteristic amount extracting unit, a defect classification unit and a classification condition setting unit. The classification condition setting unit is provided with a function to instruct a defect characteristic amount that is made to correspond to a correct answer class and a function to designate a priority order of classification, and carries out condition setting in such a way that a high priority classification results in a high correct answer rate.</p>
申请公布号 WO2009054102(A1) 申请公布日期 2009.04.30
申请号 WO2008JP02871 申请日期 2008.10.10
申请人 HITACHI, LTD.;SHIBUYA, HISAE;MAEDA, SHUNJI;HAMAMATSU, AKIRA 发明人 SHIBUYA, HISAE;MAEDA, SHUNJI;HAMAMATSU, AKIRA
分类号 G01N21/956;G01N23/225;H01L21/66 主分类号 G01N21/956
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