| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent a liquid from being left on a substrate or substrate stage when power supply is shut off. <P>SOLUTION: An immersion exposure apparatus 100 includes a projection optical system 2 configured to project a pattern of an original 10 onto the substrate 44 via a liquid 42 to expose the substrate 44 to light. The immersion exposure apparatus 100 includes a substrate stage mechanism STM including a substrate stage 52 configured to hold the substrate, an immersion unit IMU configured to supply a liquid to a gap between the substrate or the substrate stage 52 and the projection optical system 2 and to recover the liquid from the substrate or substrate stage 42, and a controller 22 configured to shut off power supply to at least the immersion unit IMU after determining that recovery of the liquid by the immersion unit IMU is completed up to a target level, if a power-off request is received. <P>COPYRIGHT: (C)2009,JPO&INPIT |
