<p>A method and system for depositing a thin film on a substrate. In the system a target material is deposited and reacted on a substrate surface to form a substantially non- absorbing thin film. The volume of non-absorbing thin film formed per unit of time may be increased by increasing the area of the surface by a factor of "x" and increasing the rate of deposition of the target material by a factor greater than the inverse of the factor "x" to thereby increase the rate of formation of the volume of non-absorbing thin film per unit of time.</p>
申请公布号
WO2009055065(A1)
申请公布日期
2009.04.30
申请号
WO2008US12170
申请日期
2008.10.27
申请人
DEPOSITION SCIENCES, INC.;BOLING, NORMAN, L.;RAINS, MILES;GRAY, HOWARD, R.