| 摘要 |
<p>A modeling method is provided to improve accuracy of an optical proximity correction by removing a process defect included in a contour image. A layout about sample patterns is designed(S10). An aerial image is obtained while extracting a real contour image about the designed sample patterns(S30). The contour image and the aerial image are arranged(S40). A modeling method determines whether a data included in the contour image is in a data tolerance range of the aerial image or not(S50). A contour image data is corrected about a part deviating from the data tolerance range of the aerial image(S60). An optimum recipe is obtained by calibrating the corrected contour image and the aerial image(S70). A simulation modeling is performed by using the recipe obtained through the calibration(S80).</p> |
