| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer holder which has a fast cooling speed and temperature rising speed and is excellent in soaking property. SOLUTION: Disclosed is the wafer holder stored in a chamber to process a wafer. The wafer holder includes a placement table having a placement surface for the wafer, the main component of the material thereof being at least one kind selected from a group of Al-C, Al-SiC, Si-SiC, SiC, AlN, C, Cu and Al; a cylindrical support having lower thermal conductivity than the placement table, supporting the placement table from the side opposite to the placement surface, and airtightly coupled to the placement table; a gap portion formed between the placement table and cylindrical support; and a cooling module and a heat generating body stored in the gap portion. The placement table has thermal conductivity of≥50 W/mK, the gap portion is isolated from the atmosphere in the chamber, and while the cooling module is provided to the placement table, the heat generating body is provided between the placement table and cooling module. COPYRIGHT: (C)2009,JPO&INPIT |
