发明名称 BRUSH ASSEMBLY AND SUBSTRATE CLEANING APPARATUS PROVIDED WITH THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a brush assembly and a substrate cleaning apparatus provided with the same. SOLUTION: In an apparatus for cleaning a substrate using a brush, the brush assembly includes: a shaft arranged so as to be rotated inside a process chamber; the brush arranged at the center part of the shaft, for receiving the supply of cleaning liquid to wash the substrate and cleaning the substrate by being in contact with the surface of the substrate; and a blowing unit for generating air flow so as to prevent the cleaning liquid supplied to the brush from flowing toward the end part of the shaft along the shaft while cleaning the substrate. Thus, the cleaning liquid supplied to the brush is prevented from leaking to the outside of the process chamber. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009094518(A) 申请公布日期 2009.04.30
申请号 JP20080262903 申请日期 2008.10.09
申请人 SEMES CO LTD 发明人 SHIN JAE YOON;LEE SUNG HEE
分类号 H01L21/304;B08B1/04 主分类号 H01L21/304
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