| 摘要 |
PROBLEM TO BE SOLVED: To solve the following problems: an alkanolamine-based resist does not have sufficient ability of removing a resist, particularly it is apt to decompose an organic solvent and gives serious damages to semiconductors and flat panel display materials. SOLUTION: A resist removal composition having N-(cyanoalkyl)-N'-(2-hydroxyalkyl)ethylene diamine shows high ability of removing a resist, does not decompose an organic solvent and gives no damage to semiconductors and flat panel display materials. The N-(cyanoalkyl)-N'-(2-hydroxyalkyl)ethylene diamine is, preferably N-(cyanoalkyl)-N'-(2-hydroxyethyl)ethylene diamine, (2-cyanoethyl)-N'-(2-hydroxyethyl)ethylene diamine, N-(2-methyl-2-cyanoethyl)-N'-(2-hydroxyethyl)ethylene diamine or the like. COPYRIGHT: (C)2009,JPO&INPIT |
