| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a simple system and a method for confining liquid between a projection optical system and a wafer in a liquid immersion photolithography system. <P>SOLUTION: The liquid immersion photolithography system includes an exposure system that exposes a substrate 101 with electromagnetic radiation, and also includes a projection optical system 100 that focuses the electromagnetic radiation on the substrate, and a liquid supply system for providing liquid between the projection optical system 100 and the substrate 101, and the projection optical system is positioned below the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
