| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for treating a process solution having improved process efficiency by minimizing time needed for the preparation time of the process solution, and an apparatus for treating a substrate using it. SOLUTION: The method includes: a step of providing a process solution for substrate treatment to a treating bath; and a circulating step of circulating the process solution through a circulating line connected to the treating bath. The circulating step includes a main circulating step where the process solution moves along the circulating line, and a sub circulating step where the process solution moves while passing through a bypass line branching from a first position of the circulating line and then coupling at a second position, wherein the main circulating step includes a step of filtering the process solution between the first and second positions. COPYRIGHT: (C)2009,JPO&INPIT
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