发明名称 |
Method and apparatus for chalcogenide device formation |
摘要 |
Chalcogenide devices are delineated and sidewalls of the devices are sealed, in an anaerobic and/or anhydrous environment environment. Throughout the delineation and sealing steps, and any intervening steps, the sidewalls are not exposed to oxygen or water. In an illustrative embodiment, a cluster tool includes an etching tool and a sealing/deposition tool configured to etch and seal the chalcogenide devices and to maintain the devices in an anaerobic and/or anhydrous environment throughout the process.
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申请公布号 |
US2009111212(A1) |
申请公布日期 |
2009.04.30 |
申请号 |
US20070977520 |
申请日期 |
2007.10.25 |
申请人 |
LOWREY TYLER;OVSHINSKY STANFORD R |
发明人 |
LOWREY TYLER;OVSHINSKY STANFORD R. |
分类号 |
H01L45/00;C23C16/02;H01L21/306 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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