| 摘要 |
<p>A drying apparatus (10) for silicon or alumina-based plate elements (15), such as the type for electronics, or other types of plates for electronics, comprises an oven (12) that develops along a path and having a drying chamber that develops along the path, on a relative lying plane. The oven (12) has an entrance (21) into the chamber (13) and an exit (23) from the chamber (13). The plate elements (15) are fed into the chamber (13) from the entrance (21) to the exit (23) along the path by means of a translation unit (18) in order to effect a drying cycle. The translation unit (18) comprises planar support elements (20, 22) able to advance along the chamber (13), which are disposed along the path and orthogonally thereto and inclined downwards with respect to the lying plane of the chamber (13) by a relative angle. The plate elements (15) are disposed on the planar support elements (20, 22) so as to define, during normal use, a passage way for the drying air, also below the plate elements (15).</p> |
