| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a double-sided exposure apparatus capable of exposing both of top and back faces of a substrate under the same exposure conditions without requiring complicated adjustment or control. <P>SOLUTION: The light from a light source lamp 10 is condensed by an elliptical mirror 11, made to return by a reflection mirror 12, focused at a fly-eye lens 13, split into reflected light and transmitted light by a spectral mirror 20, controlled for the luminous energy by a light source shutter 21, reflected by a collimation mirror 3 to produce parallel beams, and transmitted through a photomask 51 and a photomask 52 to irradiate top and back sides of a substrate 50. <P>COPYRIGHT: (C)2009,JPO&INPIT |
