发明名称 PATTERNING METHOD AND DISPLAY ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a patterning method in which highly accurate patterning is possible, without affecting the performance of a display element. SOLUTION: In the patterning method of a substrate for the display element having a gas barrier layer formed of at least one organic region and at least one inorganic region, wet etching is carried out, and for the etching, etching liquid of weak acid or weak base is used. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009094049(A) 申请公布日期 2009.04.30
申请号 JP20080127158 申请日期 2008.05.14
申请人 FUJIFILM CORP 发明人 NISHIDA NOBUHIRO
分类号 H05B33/10;H01L51/50;H05B33/02 主分类号 H05B33/10
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