<p>Methods and apparatus for supporting a substrate are provided. According to one aspect of the invention, a substrate support is provided which includes a first major surface comprising a plurality of flat support tiles and a plurality of leveling mechanisms coupled to the plurality of support tiles, wherein the plurality of leveling mechanisms are adapted to level the plurality of flat support tiles with respect to each other so as to provide a flat and level first major surface of the substrate support. Numerous other aspects are provided.</p>
申请公布号
WO2009055510(A1)
申请公布日期
2009.04.30
申请号
WO2008US80845
申请日期
2008.10.22
申请人
APPLIED MATERIALS, INC.;JOHNSTON, BENJAMIN, M.;RENTA, MICHAEL