SPUTTERING TARGET FOR MAGNETIC RECORDING FILM AND METHOD FOR MANUFACTURING SUCH SPUTTERING TARGET

摘要

Provided is a sputtering target for a magnetic recording film, by which film formation efficiency and film characteristics can be improved by suppressing growth of crystal grains, reducing magnetic permeability and increasing density. A method for manufacturing such sputtering target is also provided. The sputtering target is composed of a matrix phase, which includes Co and Pt, and a metal oxide phase. The sputtering target has a magnetic permeability of 6-15 and a relative density of 90% or more.