| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and method capable of reducing the oxygen concentration in the liquid for use in immersion lithography. <P>SOLUTION: The exposure device for exposing a substrate via the liquid has a projection optical system for projecting the image of a pattern of an original onto the substrate, a stage which moves while holding the substrate, a member having the supply port for the liquid and a recovery port and arranged between the stage and the projection optical system and spaced apart from the projection optical system, and a supply means for supplying an inert gas into the space between the projection optical system and the member via a supply opening, and the supply opening being directed toward the space. <P>COPYRIGHT: (C)2009,JPO&INPIT |
