| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing organic thin film which enables rapid film formation and enables a dense organic thin film with minimal impurities to be formed stably and in a plurality of consecutive repetitions. <P>SOLUTION: In the method of manufacturing organic thin film, the organic thin film is formed including a step (A) of bringing a substrate into contact with an organic solvent solution containing a metal-based surfactant expressed by a formula "R<SP>1</SP><SB>n</SB>MX<SB>m-n</SB>" having at least one hydrolyzable group, (in the formula R<SP>1</SP>expresses a hydrocarbon group or a hydrocarbon halide group which may have a substituent group, or a hydrocarbon group or a hydrocarbon halide group which may contain a linking group, M expresses at least one kind of metal atom selected from the group consisting of Si, Ge, Sn, Ti and Zr, X expresses a hydroxy group or hydrolyzable group, n expresses an integer of 1 to (m-1) and m expresses a valence of M), an organic acid or an acid catalyst interactable with the surfactant, and a hydrocarbon-based solvent or a hydrocarbon fluoride-based solvent; the water content within the organic solvent solution is either set or maintained within the range of 50 ppm-saturated water content in the organic solvent. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
