发明名称 MEASURING APPARATUS, EXPOSURE ARRANGEMENT AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a measuring apparatus which reduces the effect of aberration of an optical system and the effect of a change in spectral characteristics due to the transmittance of a nitric material and can measure the shape of a measuring object with high accuracy. <P>SOLUTION: The measuring apparatus, which measures the shape of the surface of the measuring object, has a light-projecting optical system which divides the light from a light source into measuring light and reference light and makes the measuring light incident on the surface of the measuring object, while making the reference light incident on a reference mirror, a light-receiving optical system which conducts the measuring light reflected on the surface of the measuring object and the reference light reflected by the reference mirror to a photoelectric conversion element, and a processing part which calculates the shape of the surface of the measuring object, based on a reference pattern which is detected by the photoelectric conversion element and formed by the measuring light and the reference light. At least one of the light-projecting optical system and the light-receiving optical system is constituted, including a mirror with power, and the imaging magnification of the light-projecting and light-receiving optical systems is determined by this mirror. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009092389(A) 申请公布日期 2009.04.30
申请号 JP20070260358 申请日期 2007.10.03
申请人 CANON INC 发明人 SASAKI AKIRA
分类号 G01B11/24;G03F9/02;H01L21/027 主分类号 G01B11/24
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