| 摘要 |
PROBLEM TO BE SOLVED: To improve safety of operations by eliminating a decrease in operation time by a gas detector and avoiding a non-detection state of a poisonous gas. SOLUTION: A substrate processing apparatus includes a reaction pipe 18 for treating a substrate 23, a supply system 29 supplying a gas into the reaction pipe, an exhaust system 33 discharging the gas inside the reaction pipe, two or more gas detectors 14a and 14b provided to the supply system or the exhaust system and detecting gases, and a controller 49 controlling the two or more gas detectors so that at least one of them always detects a gas. COPYRIGHT: (C)2009,JPO&INPIT
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