METHOD FOR COATING A SUBSTRATE WITH A DEFINED DISTRIBUTION OF COATING THICKNESS

摘要

The invention relates to a method and a device for coating a substrate with a defined distribution of coating thickness, in a vacuum coating process, by means of a coating source facing the substrate, essentially operated continuously and uniformly, wherein the substrate and the coating source are moved relative to each other. The problem addressed by the invention is to disclose a working method for adjusting a desired distribution of the thickness of a coating which can be applied to differently formed substrates in a vacuum coating process. According to the invention, the problem is solved by the fact that the substrate and/or the coating source are moved relative to each other by means of the first transport system and a second transport system respectively, due to which the substrate and/or coating source cover a series of successive defined positions and persist in each of the positions for an independently adjustable dwell period, and that the arrivals at the positions and the dwell periods take place by means of mutually synchronized controls of the two transport systems, according to the position-dependent dwelling function.