| 摘要 |
A method of detecting thin film transistor (TFT) defects in a TFT-liquid crystal display (LCD) panel, includes, in part, applying a stress bias to the TFTs disposed on the panel; and detecting a change in electrical characteristics of the TFTs. The change in the electrical characteristics of the TFTs may be detected using a voltage imaging optical system or an electron beam. The panel temperature may be varied while the bias stress is being applied. The change in the electrical characteristics is optionally detected across an array of the TFTs. |
