A method of fabricating an amorphous silicon thin film is provided to reduce the number of a poly silicon polymerization processes by using a Wurtz-type reductive coupling. A silicon monomer is mixed in the organic solvent and a dissipative system is formed. A metallic catalyst is dispersed in the dissipative system and the polysilanes polymer is formed. The polysilanes polymer is filtered, and a poly silicon is separated. The poly silicon is dissolved in the organic solvent and the polysilanes liquid is formed. The polysilanes liquid is deposited on the substrate, and the deposited polysilanes liquid is irradiated with UV rays and an amorphous silicon thin film is formed.
申请公布号
KR20090041696(A)
申请公布日期
2009.04.29
申请号
KR20070107343
申请日期
2007.10.24
申请人
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
发明人
KIM, HYUN JAE;KIM, DONG LIM;PARK, SANG HOON;JEONG, TAE HOON;KIM, SI JOON