发明名称 |
SINGLE-CRYSTAL SIC AND PROCESS FOR PRODUCING THE SAME |
摘要 |
An improved method for epitaxial growth of single-crystal SiC stably over a prolonged period of time; and a single-crystal SiC of high quality obtained as a consequence thereof. There is provided a process for producing a single-crystal SiC, including the steps of disposing in a crucible a susceptor with SiC seed crystal fixed thereto and a raw material supply pipe for supplying of carbon (C) particles and SiO2 particles as raw materials for production of single-crystal SiC; and feeding the raw materials for production of single-crystal SiC together with inert carrier gas through the raw material supply pipe onto the SiC seed crystal in the crucible with high-temperature atmosphere to thereby attain growth of single-crystal SiC, characterized in that the supply molar ratio of SiO2 to C of the raw material is such that SiO2:C = 1.05:3.0 to 2.0:3.0. Further, there is provided a single-crystal SiC produced by the process.
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申请公布号 |
KR20090042202(A) |
申请公布日期 |
2009.04.29 |
申请号 |
KR20087023660 |
申请日期 |
2008.09.26 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
AKIYAMA SHOJI;IKARI MASANORI;ABE TAKAO |
分类号 |
C30B23/02;C01B31/36;C30B29/36 |
主分类号 |
C30B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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