METHOD FOR FABRICATING FINE PATTERN AND OPTICAL DEVICE

摘要

A manufacturing method of a micro pattern and an optical device are provided to form a micro pattern with a high throughput, a large area, and a low cost. A layer(2) to be processed is formed on a transparent base layer(1). A resist layer is formed on the layer to be processed, and is patterned by a nano imprint method at the same time. A patterned resist layer(3) having a concave part(53) is formed on a top surface of the resist layer. A hard mask layer(4) of a metal layer is formed on a top surface(3a) of the patterned resist layer. A resist residue(55) remaining in a bottom part(53a) of the concave part is removed by etching. The layer to be processed is etched by using the patterned resist layer as a mask.