发明名称 PROCESSING DEVICE OF SHOWER HEAD HOLE FOR SEMICONDUCTOR WAFER DEPOSITION EQUIPMENTS
摘要 A processing device of a shower head hole for semiconductor wafer deposition equipments is provided to manufacturing a large wafer shower head by using a slurry abrasive and ultrasonic oscillator. A body frame(100) comprises a slant supporter(110) and a slope task bracket(130). A supersonic vibration processing unit(200) is movable along the slant support, and the supersonic vibration processing unit processes an object with the supersonic vibration. A processing pressure controller(300) controls working pressure of the supersonic vibration processing unit. A slurry abrasive supply unit(400) supplies a mixed slurry to the processed object(500).
申请公布号 KR20090041686(A) 申请公布日期 2009.04.29
申请号 KR20070107328 申请日期 2007.10.24
申请人 LEE, YEON HEE 发明人 LEE, YEON HEE
分类号 H01L21/205 主分类号 H01L21/205
代理机构 代理人
主权项
地址