发明名称 Method of forming a low temperature-grown buffer layer, a light emitting element and method of making same, and light emitting device
摘要 A method of forming a low temperature-grown buffer layer having the steps of: placing a Ga2O3 substrate in a MOCVD apparatus; providing a H2 atmosphere in the MOCVD apparatus and setting a buffer layer growth condition having an atmosphere temperature of 350° C. to 550° C.; and supplying a source gas having two or more of TMG, TMA and NH3 onto the Ga2O3 substrate in the buffer layer growth condition to form the low temperature-grown buffer layer on the Ga2O3 substrate.
申请公布号 US7524741(B2) 申请公布日期 2009.04.28
申请号 US20060393808 申请日期 2006.03.31
申请人 TOYODA GOSEI CO., LTD.;KOHA CO., LTD. 发明人 USHIDA YASUHISA;SHINODA DAISUKE;YAMAZAKI DAISUKE;HIRATA KOJI;IKEMOTO YUHEI;SHIBATA NAOKI;AOKI KAZUO;GARCIA VILLORA ENCARNACION ANTONIA;SHIMAMURA KIYOSHI
分类号 H01L21/36;H01L21/20;H01L33/06;H01L33/12;H01L33/32;H01L33/42;H01L33/54;H01L33/56;H01L33/60;H01L33/62 主分类号 H01L21/36
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