发明名称 Diffusie-oven en werkwijze voor de temperatuurgeleiding.
摘要 The diffusion oven useful in a semiconductor manufacture and for doping solar cells, comprises a reactor (1) enclosed by a reaction pipe (2), an outer casing (3), which encloses the reaction pipe, heating elements (4) arranged between the reaction pipe and the outer casing, means (5) for locking both ends of the reaction pipe, means (6) for locking both ends of the outer casing, means for producing a vacuum, and means for supplying a reaction gas or a reaction gas mixture into the reactor. The pipe locking means comprise connections for a first gas line. The diffusion oven useful in a semiconductor manufacture and for doping solar cells, comprises a reactor (1) enclosed by a reaction pipe (2), an outer casing (3), which encloses the reaction pipe, heating elements (4) arranged between the reaction pipe and the outer casing, means (5) for locking both ends of the reaction pipe, means (6) for locking both ends of the outer casing, means for producing a vacuum, and means for supplying a reaction gas or a reaction gas mixture into the reactor. The pipe locking means comprise connections for a first gas line, where the connections are connected with a first gas circulating system and the casing locking means comprise a connection for a second gas line, where the connections are connected with a second gas circulating system. The first and second gas circulating systems consist of first and second gas guiding arrangements respectively, which are connected by first and second gas lines with the connections of the locking means, respectively. The guiding arrangements produce a controlled gas movement. The gas circulating systems contain heat exchanger. The first gas circulating system comprises an input and an output valve for closing the system, a bypass for the cooling equipments, and a heater. A gas-flow heater is arranged in the gas lines and comprises flow guiding plates, which are implemented so that a spiral movement of the flowing gas takes place by the gas flow heater, and rod-shaped and parallelly arranged tubular heating elements. An independent claim is included for a method for temperature guidance of substrates brought into a reactor of a diffusion oven.
申请公布号 NL2002126(A1) 申请公布日期 2009.04.28
申请号 NL20082002126 申请日期 2008.10.23
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 CHRISTOPH KOECKERT;UDO WILLKOMMEN;HANS-CHRISTIAN HECHT;SABINE GREGOR;VIVIAN ALBERTS
分类号 C23C16/455;C23C16/46;C23C16/52;H01L21/02 主分类号 C23C16/455
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