发明名称 Continually variable demetallization of metallized films and similar objects
摘要 A method of generating a variable demetallized pattern in a holographic web and a security device using such method. A holographic microstructure pattern is imparted to an oligomer disposed on a surface of a substrate. A metal layer, such as aluminum, is deposited to the holographic microstructure pattern of the substrate and then covered with a variable resist pattern. The variable demetallized pattern in the holographic web is then generated by removing the metal layer not covered by said variable resist pattern.
申请公布号 US7525705(B2) 申请公布日期 2009.04.28
申请号 US20050267082 申请日期 2005.11.03
申请人 JDS UNIPHASE CORPORATION 发明人 MORWALD WILLIAM C.;MENTZ BRIAN
分类号 G03H1/00;B42D15/00 主分类号 G03H1/00
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