| 摘要 |
A laser beam irradiation equipment which is used to crystallize amorphous silicon with the polysilicon for amorphous silicon crystallization is provided to minimize the influence of the laser beam having abruptly amplified energy. A laser beam generator(210) irradiates the laser beam to office. A first homogenizer(215) is positioned in the laser beam generation system front side. The cross section of a first homogenizer is an elliptical shape. A plurality of first reduction lens is laminated in top and bottom because the first homogenizer is long. A plurality of first reduction lenses in the form of the first transparency bar of the rectangular shape side is replaced. The reduction lens of the transparency bar shape has the infinite surface curvature radius. A condensing lens(225) is positioned by being separated from the first homogenizer. An objective lens(230) is positioned by being separated from the condensing lens. |
