发明名称 |
Photomask and manufacturing method thereof, fabrication process of an electron device |
摘要 |
A photomask made by using a negative photoresist includes a transparent substrate defined with a device chip area, an opaque device pattern formed on the transparent substrate in the device chip area, and a dummy opaque pattern provided on the transparent substrate outside of the device chip area.
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申请公布号 |
US7524591(B2) |
申请公布日期 |
2009.04.28 |
申请号 |
US20050126295 |
申请日期 |
2005.05.11 |
申请人 |
FUJITSU MICROELECTRONICS LIMITED |
发明人 |
HOSONO KOJI |
分类号 |
G03C5/00;G03F1/70;G03F1/80;H01L21/027 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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