发明名称 Material for the treatment of lithographic substrates and lithographic printing plates
摘要 Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
申请公布号 US7524613(B2) 申请公布日期 2009.04.28
申请号 US20060813678 申请日期 2006.01.12
申请人 KODAK GRAPHIC COMMUNICATIONS, GMBH 发明人 BAUMANN HARALD;STREHMEL BERND;FIEBAG ULRICH;VON GYLDENFELDT FRIEDERIKE;EBHARDT TANJA;DALLMANN ULRIKE;FRANK DIETMAR
分类号 G03C1/76;C08G77/30;G03F7/09;G03F7/11;G03F7/40 主分类号 G03C1/76
代理机构 代理人
主权项
地址