发明名称 |
Material for the treatment of lithographic substrates and lithographic printing plates |
摘要 |
Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
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申请公布号 |
US7524613(B2) |
申请公布日期 |
2009.04.28 |
申请号 |
US20060813678 |
申请日期 |
2006.01.12 |
申请人 |
KODAK GRAPHIC COMMUNICATIONS, GMBH |
发明人 |
BAUMANN HARALD;STREHMEL BERND;FIEBAG ULRICH;VON GYLDENFELDT FRIEDERIKE;EBHARDT TANJA;DALLMANN ULRIKE;FRANK DIETMAR |
分类号 |
G03C1/76;C08G77/30;G03F7/09;G03F7/11;G03F7/40 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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