发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
<p>Provided is a semiconductor device, in which the degree of flatness of 0.3 nm or less in terms of a peak-to-valley (P-V) value is realized by rinsing a silicon surface with hydrogen-added ultrapure water in a light-screened state and in a nitrogen atmosphere and in which a contact resistance of 10-11 7cm2 or less is realized by setting a work function difference of 0.2 eV or less between an electrode and the silicon. The semiconductor device thus provided can operate on a frequency of 10 GHz or higher.</p> |
申请公布号 |
KR20090039758(A) |
申请公布日期 |
2009.04.22 |
申请号 |
KR20097002708 |
申请日期 |
2007.07.12 |
申请人 |
NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY;FOUNDATION FOR ADVANCEMENT OF INTERNATIONAL SCIENCE |
发明人 |
OHMI TADAHIRO;TERAMOTO AKINOBU;KURODA RIHITO |
分类号 |
H01L21/336;H01L21/8238;H01L29/417;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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