发明名称 APPARATUS FOR DRYING SUBSTRATE
摘要 An apparatus for drying a substrate and a method thereof for drying the substrate in which the coating solution is coated are provided to improve the ventilation function of the vacuum pump within a chamber. A vacuum part(200) comprises an exhaust pipe(210), a vacuum pump(230) and a pipe chiller(250). The task end of the exhaust pipe is connected to the outer side of the chamber(100). The other end of the vacuum pump is connected to the exhaust pipe. The internal space of the chamber is exhausted from the vacuum pump. The pipe chiller is installed on the conduit line of the exhaust pipe. The installation area of the conduit line rapidly is cooled in the pipe chiller.
申请公布号 KR20090039378(A) 申请公布日期 2009.04.22
申请号 KR20070104988 申请日期 2007.10.18
申请人 K.C.TECH CO., LTD. 发明人 JEOUNG, EUN MI
分类号 G02F1/13 主分类号 G02F1/13
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