CLEANING MEMBER, DELIVERY MEMBER WITH CLEANING FUNCTION, AND METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS

摘要

Provided is a cleaning member, which is capable of removing minute foreign matter, preferably foreign matter of a submicron level simply, exactly, and sufficiently, without contaminating a cleaning site. Further provided is a deliverymember with a cleaning function having the cleaning member and a method of cleaning a substrate processing apparatus using the delivery member with a cleaning function.
The cleaning member of the present invention includes a cleaning layer having a plurality of protrusions of a columnar structure on the surface, in which an aspect ratio of the protrusions of a columnar structure is 5 or more.