| 摘要 |
<p>An exposing apparatus and a method for manufacturing a device are provided to enlarge a measurable range while maintaining the precision of the position measurement of the substrate stage by using rough measurement marks and a fine measurement marks. A measurement mark including a rough measurement mark and a fine measurement mark for a disk is formed in a disk stage. The measurement mark including the rough measurement mark and the fine measurement mark for a substrate is formed in a substrate stage. A controller roughly measures a relative position in the disk stage and the substrate stage by using the rough measurement marks for the disk and the substrate. The controller finely measures the relative position between the disk stage and the substrate stage by using the fine measurement marks.</p> |
