发明名称 |
Semiconductor substrate for photosensitive chip |
摘要 |
A circuit layout for a photosensitive chip includes a semiconductor substrate, a plurality of first circuit lines and a plurality of second circuit lines. The semiconductor substrate has a matrix of photosensitive units. Each photosensitive unit has a first blocking region, a second blocking region and a photosensitive region formed on the semiconductor substrate. The first blocking region is formed between neighboring photosensitive regions aligned in a vertical direction. The second blocking region is formed between neighboring photosensitive regions aligned in a horizontal direction. Free electrons produced by illuminating the photosensitive units are blocked by the first and the second blocking regions.
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申请公布号 |
US7523432(B2) |
申请公布日期 |
2009.04.21 |
申请号 |
US20070936800 |
申请日期 |
2007.11.08 |
申请人 |
SUNPLUS TECHNOLOGY CO., LTD. |
发明人 |
VAN BLERKOM DANIEL;YANG MENG-CHANG |
分类号 |
G06F17/50;G06F9/45;G06F9/455;H01L21/70;H01L27/146 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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