| 摘要 |
A projection exposure apparatus, which has a projection optical system and exposes a substrate through the projection optical system and a liquid, while a gap between the projection optical system and the substrate is filled with the liquid. The apparatus includes a light-receiving element configured to detect light incident thereon through the projection optical system and the liquid, a vessel in which the light-receiving element is arranged, and a fluoroplastic filling a space within the vessel to cover the light-receiving element.
|
