发明名称 |
Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition |
摘要 |
Provided are an ester group-containing poly(imide-azomethine)copolymer having low linear thermal expansion coefficient; a production method thereof; an ester group-containing poly(amide acid-azomethine)copolymer to serve as the precursor of the poly(imide-azomethine)copolymer; a positive photosensitive composition including the poly(amide acid-azomethine)copolymer and a photosensitizer; a method for forming a fine pattern of an ester group-containing poly(imide-azomethine)copolymer from the composition; and a method for forming a fine pattern of an ester group-containing poly(imide-azomethine)copolymer by etching a photosensitizer-free, ester group-containing poly(imide-azomethine)copolymer in an alkaline solution. The ester group-containing poly(imide-azomethine)copolymer comprises an ester group-containing azomethine polymer unit of the formula (1) and an imide polymer unit of the formula (2): wherein in the formulas (1) and (2), A and D are each independently a divalent aromatic or aliphatic group with D containing an ester group; and B is a tetravalent aromatic or aliphatic group.
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申请公布号 |
US7521167(B2) |
申请公布日期 |
2009.04.21 |
申请号 |
US20060433436 |
申请日期 |
2006.05.15 |
申请人 |
SONY CORPORATION;SONY CHEMICAL & INFORMATION DEVICE CORPORATION |
发明人 |
HASEGAWA MASATOSHI;ISHII JUNICHI |
分类号 |
G03F7/023;C08G69/26;G03F7/30 |
主分类号 |
G03F7/023 |
代理机构 |
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