发明名称 Vertical thyristor in complementary SiGe bipolar process
摘要 In a complementary SiGe bipolar process, a pnpn thyristor structure is formed from some of the layers of a pnp transistor and an npn transistor formed on top of each other and making use of the SiGe gates to define the blocking junction.
申请公布号 US7521310(B1) 申请公布日期 2009.04.21
申请号 US20050261235 申请日期 2005.10.29
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 VASHCHENKO VLADISLAV;SADOVNIKOV ALEXEL;HOPPER PETER J.
分类号 H01L21/8238 主分类号 H01L21/8238
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