| 摘要 |
A reflection/transmission type LCD device and a manufacturing method thereof are provided to simplify a mask process and improve the aperture ratio. A substrate(100) is defined by a reflective region(B) and a transmission region(A). A thin film transistor(TFT) is formed at a portion where a gate line and data line intersect with each other. An organic protection film(120) has different thicknesses at the reflective region and transmission region and is formed on the thin film transistor. A reflective electrode(124) is formed in the reflective region on the organic protection film. A pixel electrode(130) is connected with the drain electrode(109a) of the thin film transistor. |
